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Effect of impingement and evaporation on drift-induced step instabilities on Si(1 1 1) vicinal face near transition temperature

机译:冲击和蒸发对转变温度附近si(111)邻近面漂移引起的阶梯不稳定性的影响

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摘要

Bearing the Si(1 1 1) vicinal face in mind, we study the effect of impingement and evaporation on drift-induced step instabilities. On a Si(1 1 1) face, transition between 1 × 1 structure and 7 × 7 structure occurs at 860 {ring operator} C. On the vicinal face near the transition temperature, the two structures coexist: the 1 × 1 structure is at the lower side of step and the 7 × 7 structure is at the upper side. On the 1 × 1 structure, the diffusion coefficient is larger than that on the 7 × 7 structure. When the difference in the diffusion coefficients is taken into account, step bunching occurs with drift of adatoms. In a conserved system with fast drift, separation and coalescence of steps occur repeatedly, and the bunches grow gradually. The motion of bunches changes when the impingement or evaporation is present. With the impingement, the separation of steps is suppressed and the bunches grow via coalescence of small ones with step-down drift, while the separation is more frequent than that in conserved system with step-up drift. With the evaporation, the relation is the opposite. © 2007 Elsevier B.V. All rights reserved.
机译:牢记Si(1 1 1)邻近面,我们研究了撞击和蒸发对漂移引起的阶跃不稳定性的影响。在Si(1 1 1)面上,1×1结构和7×7结构在860 {ring operator} C处发生转变。在转变温度附近的邻面上,这两种结构共存:1×1结构为在阶梯的下侧,而7×7结构在上侧。在1×1结构上,扩散系数大于7×7结构上的扩散系数。当考虑到扩散系数的差异时,随着原子的漂移,发生了台阶聚束。在具有快速漂移的保守系统中,步骤的分离和合并反复发生,并且束逐渐增长。当发生碰撞或蒸发时,束的运动发生变化。在碰撞的情况下,步距的分离得到抑制,并且束通过具有降级漂移的小束的聚结而增长,而分离比在具有递升漂移的保守系统中更频繁。随着蒸发,关系是相反的。 ©2007 Elsevier B.V.保留所有权利。

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